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Bas-relief panel
Bas-relief panel

Bas-relief panel

Sheila Hicks (American (lives and works in Paris), born in 1934)
1988
Medium/TechniqueBleached linen; "macro" embroidery, cotton canvas
DimensionsOverall: 100.3 × 100.3 × 3 cm (39 1/2 × 39 1/2 × 1 3/16 in.)
Credit LineThe Daphne Farago Collection
Accession number2012.1324
On View
Not on view
ClassificationsFiber arts
ProvenanceSeptember 10, 1989, sold by the artist Sheila Hicks, Paris, France to Mrs. Farago, Little Compton, RI; 2012, year-end gift of the Daphne Farago Collection to the MFA. (Accession date: February 27, 2013)
Copyright© Sheila Hicks